KL NPR 20 micron negative photoresist offers high sensitivity, high throughput, and excellent process latitude.
- For use in i-Line, g-Line and broadband packaging applications
- Covers 20 – 30 microns in a single coat
- Thick straight wall photoresist designed for use with industry standard 0.26 N TMAH developers
For more information on KemLab KL NPR negative photoresist, please contact Richard Collett at: firstname.lastname@example.org