Versum Materials Chamber Cleaning Chemicals

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Product Name Description/Benefits

Carbon Tetrafluoride (CF4)

Carbon Tetrafluoride (CF4) is used for chamber cleaning in semiconductor applications, in MEMS etching applications, and in Flat Panel Display etching applications.

Nitrogen Trifluoride (NF3)

Nitrogen Trifluoride (NF3) is used in Displays/Flat Panel, Photovoltaics, Compound Semiconductor, MEMS and Silicon Semiconductor manufacturing processes.

Trans 1,2-Dichloroethylene Trans-LC®

EXTREMA® Trans 1,2-Dichloroethylene (Trans-LC®), a Schumacher® product, is an ozone-safe liquid chlorine source for use in silicon oxidation and tube cleaning.  It features a low toxic hazard rating and is not restricted as an ozone depleting chemical.  Trans-LC provides consistent process results and is superior in performance to corrosive HCl.  The use of Trans-LC is preferred over any known chlorine sources in the low temperature range below 800oC.

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