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Product Name Description/Benefits

Boron TriBromide (BBr3)

Phosphorus Oxychloride (POCl3)

Phosphorus Oxychloride (POCl3) is a liquid Phosphorus used for diffusion of N-type regions into silicon substrates, for use in semiconductor and photovoltaic process applications.

Triethylarsenate (TEASAT)

Triethylarsenate (TEASAT), a Schumacher® product, is a liquid source used with Tetraethyl Orthosilicate (TEOS) to deposit a highly conformal arsenic-doped glass utilized for manufacturing trench capacitors in advanced DRAMS.

Triethylborate (TEB)

Triethylborate (TEB), a Schumacher® product, is a liquid boron source used for Borosilicate (BSG) and Borophosphosilicate (BPSG) glass Thin Film Deposition in low pressure, atmospheric pressure and plasma enhanced CVD systems

Triethylphosphate (TEPO)

Triethylphosphate (TEPO), a Schumacher® product, is a liquid phosphorus source used in depositing PSG and BPSG films for semiconductor applications.

Trimethlyborate (TMB)

EXTREMA® Trimethylborate (Trimethylborate), a Schumacher® product, is used as a liquid boron dopant in the Thin Film Deposition of Borosilicate (BSG) and Borophosphosilicate (BPSG) glasses. It is used to reduce the reflow temperatures of the deposited glass.

Trimethylphosphate (TMPO)

TMPO (Trimethylphosphate), a Schumacher product, is a liquid phosphorus source used in depositing PSG and BPSG films for semiconductor applications.  TMPO is a high purity liquid precursor used in producing high quality dielectric films.

Trimethylphosphite (TMPI)

EXTREMA® Trimethylphosphite (TMPI), a Schumacher® product, is a liquid phosphorus source used with silicon sources such as TEOS to dope SiO2 in PSG and BPSG applications.

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