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Product Name Description/Benefits

CupraSelect (CuTMVS)

CupraSelect (CuTMVS) is a precursor for depositing high quality copper films by CVD. Capable of depositing conformal films within features such a vias.

Pentakis-dimethylamino Tantalum (PDMAT)

Pentakis-dimethylamino Tantalum (PDMAT) is a solid source material for chemical vapor deposition or atomic layer deposition of highly conformal tantalum oxide or tantalum nitride films.

Tetrakis-dimethylamino Titanium (TDMAT)

Tetrakis-dimethylamino Titanium (TDMAT), a Schumacher® product, is a liquid chemical source suitable for the chemical vapor Thin Film Deposition (CVD) of titanium nitride films.

Tetrakis-ethylmethylamino Zirconium (TEMAZ)

Tetrakis-ethylmethylamino Zirconium (TEMAZ) is a liquid chemical source suitable for chemical vapor Thin Film Deposition or atomic layer Thin Film Deposition of zirconium oxide films. ZrO films are effective high-k dielectrics in IC applications.

TiCl4 (Titanium Tetrachloride)

Titanium Tetrachloride (TiCl4), a Schumacher® product, is a liquid source material for the chemical vapor Thin Film Deposition (CVD) of titanium nitride, titanium dioxide and titanium metal.

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