Dow® UV6 Positive DUV Photoresist


UV6 is a positive DUV photoresist and has been optimized to provide vertical profile imaging of dense and semi-isolated features for device production design rules to 180 nm. This resist is ideally suited for use with AR2™ Anti-reflectant and a variety of inorganic substrates. It maintains minimal sensitivity to PEB temperature variation (<5 nm/°C), superior etch resistance, a wide process window, and low bias properties provides high yielding device fabrication. UV6 is most compatible with 0.26N developers (2.38% TMAH).
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