MICROPOSIT S1800 SERIES PHOTO RESISTS are positive photoresist systems engineered to satisfy the microelectronics industry’s requirements for advanced IC device fabrication. The system has been engineered using a toxicologically safer alternative casting solvent to the ethylene glycol derived ether acetates. Dow S1800 is a legacy product of Shipley (Rohm and Haas).
Softbake: 115°C/60sec Contact
Expose: i-line, Broadband
Develop: MF-319 21°C 10/30sec spray/puddle