KemLab® KL5300 Series General Purpose Positive Photoresist

Spin Speed Curve for KemLab KL 5300 Positive Photoresist
KemLab-KL-5300-Positive-Photoresist-Spin-Speed-Chart

kemlab-kl-5300-positive-photoresist

The KL5300 series is a quality, general purpose, positive photoresist optimized for i-Line, g-Line, and broadband applications. KL5300 offers high sensitivity, and high throughput suitable for IC fabrication.

ADVANTAGES:

  • Film Thickness range of 0 – 2.5 mm
  • Designed for use with industry standard 0.26 N TMAH
    developers
  • Custom formulations available
PDF-Icon-KemLabSDS-Kemlab-KL-1600

Typical Process:

kl-5300-sample-process