KemLab KL 5302 Hi-Res resist for maskless grating patterning using interference lithography. Newly formulated to provide improved control during exposure and develop. KL 5302 Hi-Res Ultra Thin Resist is designed for i-line, g-line, and broadband exposures, but especially for applications where pattern collapse is an issue.
Expose: Broadband, i-line, g-line
Develop: 0.26N TMAH