Developers

Metal Ion Free (Organic) Developers

  • MICROPOSIT™ MF-CD26

    MICROPOSIT™ MF-CD26 Developer is a 0.26N Surfactant Free product for Conventional and AdvancedPhotoresists.
    MF-CD26 is a Metal Ion Free, TMAH based Developer.

  • MICROPOSIT™ MF-24A

    MICROPOSIT MF CD-24A Developer is the surfactated version of the MICROPOSIT MF CD-26 Developer with a normality of .24N.

  • MICROPOSIT™ MF-26A

    MICROPOSIT MF CD-26A Developer is the surfactated version of the MICROPOSIT MF CD-26 Developer with a normality of .26N.

  • MICROPOSIT™ MF-312

    MICROPOSIT MF-312 Developer is a 0.27N product for Conventional and AdvancedPhotoresists.
    MF-312 is a Metal Ion Free, TMAH based Developer.

  • MICROPOSIT™ MF-319

    MICROPOSIT MF-319 Developer is a 0.238N product for Conventional and AdvancedPhotoresists.
    MF-319 is a Metal Ion Free, TMAH based Developer.

  • MICROPOSIT™ MF-321

    MICROPOSIT MF-321 Developer is a 0.210N lower normality product for Conventional and Advanced Photoresists.
    MF-321 is a Metal Ion Free, TMAH based Developer.

Metal Ion Bearing (Inorganic) Developers

  • MICROPOSIT™ MP5000

    MICROPOSIT 5000 Developer is a concentrate KOH aqueous alkaline solution (1.52N) product suitable for all general microelectronic applications.

  • MICROPOSIT™ M351

    MICROPOSIT 351 Developer is a NaOH aqueous alkaline solution (1.38N 4% NaOH) product suitable for all general microelectronic applications.