KemLab® KL6000 Series Thick Positive Photoresist

Spin Speed Curve for KemLab KL 6000 Positive Photoresist
KemLab-KL-6000-Positive-Photoresist-Spin-Speed-Chart

kemlab-kl-5300-positive-photoresist

The KL 6000 series are positive photoresists for use in i-Line, g-Line and broadband applications. KL6000 offers high sensitivity, high throughput, and excellent process latitude.

ADVANTAGES:

  • Cover 2.5 – 12 µm in a single coat
  • Designed for use with industry standard 0.26 N TMAH developers
  • No PEB necessary
  • Custom formulations available
PDF-Icon-KemLabSDS-Kemlab-KL-6000

Typical Process:

kl-6000-sample-process